中科瑞晶(杭州)科技有限公司

GaAs

Gallium arsenide (chemical formula:) is a compound synthesized by two elements of gallium and arsenic. It is an important group IIIA and group VAcompound semiconductor material. 

使用/应用

Gallium arsenide(GaAs) can be used to make microwave integrated circuits, infrared light-emitting diodes, semiconductor lasers and solar cells. GaAs is often used as the base material for the epitaxial growth of III-V semiconductors, including indium gallium arsenide, aluminum gallium arsenide, and so on.

特点/优势

▪ Very high electron mobility.
▪ GaAs cells are relatively insensitive to heat compare to silicon cells. Hence it offers high thermal stability.
▪ Lower noise.
▪ Operates over wide temperature range.
▪ High efficiency and resistance to radiation.

  • Single Crystal

    Doping

    Conductivity Type

    Carrier Concentration (cm-3)

    Dislocation Density (cm-2)

    Growth Method

    Standard Substrate

    GaAs

    None

    Si

    /

    <5×105

    LEC

    HB

    Dia3″

    Dia3″×0.5

    Dia2″×0.5

    Si

    N

    >5×1017

    Cr

    Si

    /

    Fe

    N

    ~2×1018

    Zn

    P

    >5×1017

    Dimension

    25×25×0.5mm10×10×0.5mm10×5×0.5mm5×5×0.5mm

    According to customer needs, substrates with special orientation and size can be customized.

    Surface Roughness

    Surface roughness(Ra):<=5Å
    Atomic Particle Microscopy (AFM) test report can be provided.

    Polishing

    One side or two sides

    Package

    Class 100 clean bag, Class 1000 super clean room



  • 25×25×0.5mm10×10×0.5mm10×5×0.5mm5×5×0.5mm

    According to customer needs, substrates with special orientation and size can be customized.